Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond

Name: Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond
Brand: Guilei Wang
SKU: 9789811500459
Price: 109.12 EUR
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Guilei Wang

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Autorius Guilei Wang

Leidėjas Springer Verlag, Singapore

Leidimo metai 2019 m.

Puslapių skč. 115 psl.

Viršelis Kietas viršelis

ISBN 9789811500459

Leidimas 2019 ed.

Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond

Investigation on SiGe Selective Epita...

€109,12

€109,12 €112,49

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Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond

Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond

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